Electron Beam Evaporation
E-beam is generated from a tungsten filament and driven by electric and magnetic fields toward source material and transforms it into the gaseous phase to be deposited on the substrate surface.
An ultra high-vacuum (UHV) E-beam deposition system is characterized by pressures lower than 10-8 ~10-12 Torr and it is common in chemistry, physics, and engineering. UHV environment is very important to scientific research, because experiments often require surfaces to be maintained in a contamination-free state for the duration of the process and use of low energy electron and ion-based experimental techniques without undue interference from gas phase scattering.In the ultra-high vacuum environment E-beam system, SYSKEY can perfectly produce high-quality thin films.
Design the substrate rotary coating mechanism for ultra-high vacuum and high temperature heating, use ceramic Palin rotation, and do a water cooling cycle inside to protect the mechanism to make sure the stability of long-term operation.
|Configurations and benefits